Substrate processing apparatus

ABSTRACT

A substrate processing apparatus includes a substrate stage that supports a substrate, a follower stage disposed on a same plane as the substrate stage, a first driving unit that moves the follower stage in parallel with a first direction, and a second driving unit that moves the substrate stage in parallel with the first direction. The second driving unit includes a voice magnet member disposed on the substrate stage, and a voice coil member disposed on the follower stage and spaced apart from the voice magnet member.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. nonprovisional patent application is a divisional applicationof U.S. patent application Ser. No. 15/481,686, titled SUBSTRATEPROCESSING APPARATUS and filed on Apr. 7, 2017, which, in turn, claimspriority under 35 U.S.C § 119 to Korean Patent Application10-2016-0116436 filed in the Korean Intellectual Property Office on Sep.9, 2016, the disclosures of which are incorporated by reference hereinin their entireties.

TECHNICAL FIELD

The inventive concept relates to a substrate processing apparatus.

DISCUSSION OF THE RELATED ART

Fabrication of semiconductor devices or flat panel displays requiresvarious processes such as ion implantation, deposition, diffusion,photolithography, etching, etc. The photolithography process may beemployed to form patterns on a substrate and/or a wafer. Thephotolithography process may include coating a photoresist on thesubstrate and exposing the substrate to light to transfer a mask patternon the photoresist coating. The photolithography process may furtherinclude developing and removing the photoresist from the substrate.

The exposure process may be performed by using a substrate processingapparatus The substrate processing apparatus may include a moving stageunit that moves the substrate. The moving stage unit may move thesubstrate in first and second directions that cross each other duringthe fabrication process. Fine circuit patterns may be formed on thesubstrate that is moved by the moving stage unit. The location of themoving stage unit should be accurately controlled.

SUMMARY

According to an exemplary embodiment of the inventive concept, asubstrate processing apparatus may block disturbance acting on asubstrate stage from a follower stage.

According to an exemplary embodiment of the inventive concept, asubstrate processing apparatus nay remove reaction caused by movement ofa substrate stage and a follower stage.

According to an exemplary embodiment of the inventive concept, asubstrate processing apparatus includes a substrate stage that supportsa substrate, a follower stage disposed on a same plane as the substratestage, a first driving unit that moves the follower stage in parallelwith a first direction, and a second driving unit that moves thesubstrate stage in parallel with the first direction. The second drivingunit includes a voice magnet member disposed on the substrate stage, anda voice coil member disposed on the follower stage and spaced apart fromthe voice magnet member.

According to an exemplary embodiment of the inventive concept, asubstrate processing apparatus includes a base frame, a gantry fixed tothe base frame, and a moving stage unit that moves in parallel with afirst direction between the base frame and the gantry. The moving stageunit includes a substrate stage that supports a substrate, a followerstage that is disposed on a same plane as the substrate stage and is notin contact with the substrate stage, a voice magnet member disposed onthe substrate stage, a voice coil member disposed on the follower stage,wherein the voice coil member is exposed to a magnetic field produced bythe voice magnet member such that the voice magnet member experiences aLorentz force in parallel with the first direction, and a first drivingunit that moves the follower stage in parallel with the first direction.

According to an exemplary embodiment of the inventive concept, asubstrate processing apparatus includes a substrate stage that supportsa substrate, wherein the substrate stage extends along a first planeformed by a first direction and a second direction, wherein the firstand second directions cross each other, a follower stage disposed on thesubstrate stage and arranged substantially parallel to the first plane,a first driving unit that moves the follower stage in parallel with thefirst direction, and a second driving unit that moves the substratestage in parallel with the first direction. The second driving unitincludes a first magnet extending in the second direction and disposedon the substrate stage, wherein the first magnet includes a first grooveextending in the second direction, and a first member fixed to thefollower stage, wherein a portion of the first coil member is insertedin the first groove.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features of the inventive concept will become moreapparent by describing in detail exemplary embodiments thereof inconjunction with the accompanying drawings, in which:

FIG. 1 is a perspective view illustrating a substrate processingapparatus according to an exemplary embodiment of the inventive concept;

FIG. 2 is a plan view illustrating the substrate processing apparatus ofFIG. 1 according to an exemplary embodiment of the inventive concept;

FIG. 3 is a front view illustrating the substrate processing apparatusof FIG. 1 according to an exemplary embodiment of the inventive concept;

FIG. 4 is a block diagram illustrating the substrate processingapparatus of FIG. 1 according to an exemplary embodiment of theinventive concept;

FIG. 5 is a perspective view illustrating a moving stage unit of FIG. 1according to an exemplary embodiment of the inventive concept;

FIG. 6 is a side view illustrating a substrate stage of FIG. 1 accordingto an exemplary embodiment of the inventive concept;

FIG. 7A is a cross-sectional view taken along line I-I′ of FIG. 5according to an exemplary embodiment of the inventive concept;

FIG. 7B is an enlarged view of section A of FIG. 7A according to anexemplary embodiment of the inventive concept;

FIGS. 8A and 8B are perspective views illustrating a follower stage anda portion of a first driving unit of FIG. 5 according to an exemplaryembodiment of the inventive concept;

FIG. 9 is a perspective view illustrating a guide frame unit, a portionof a first driving unit, and a portion of a balance mass unit of FIG. 1,according to an exemplary embodiment of the inventive concept;

FIG. 10 is a front view illustrating a guide frame unit, a portion of afirst driving unit, and a portion of a balance mass unit of FIG. 1,according to an exemplary embodiment of the inventive concept;

FIG. 11 is a perspective view illustrating a balance mass unit of FIG. 1according to an exemplary embodiment of the inventive concept;

FIG. 12 is a front view illustrating a balance mass unit of FIG. 1according to an exemplary embodiment of the inventive concept;

FIG. 13 is a diagram illustrating movement of a moving stage unit ofFIG. 1 according to an exemplary embodiment of the inventive concept;

FIG. 14 is a flow chart illustrating a driving operation of a movingstage unit of FIG. 1, according to an exemplary embodiment of theinventive concept;

FIG. 15 is a flow chart illustrating a driving operation of a movingstage unit of FIG. 1, according to an exemplary embodiment of theinventive concept; and

FIG. 16 is a perspective view illustrating a movement relationshipbetween a moving stage unit and a balance mass unit of FIG. 1 accordingto an exemplary embodiment of the inventive concept.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Exemplary embodiments of the inventive concept will be described morefully hereinafter with reference to accompanying drawings.

FIG. 1 is a perspective view illustrating a substrate processingapparatus according to an exemplary embodiment of the inventive concept.FIG. 2 is a plan view illustrating the substrate processing apparatus ofFIG. 1 according to an exemplary embodiment of the inventive concept.FIG. 3 is a front view illustrating the substrate processing apparatusof FIG. 1 according to an exemplary embodiment of the inventive concept.FIG. 4 is a block diagram illustrating the substrate processingapparatus of FIG. 1 according to an exemplary embodiment of theinventive concept.

Referring to FIGS. 1 to 4, a substrate processing apparatus 10 may beused to perform a substrate treatment process. In an exemplaryembodiment of the inventive concept, the substrate processing apparatus10 is an exposure apparatus that can be used to form a fine circuitpattern on a substrate. The substrate processing apparatus 10 mayinclude a base frame 100, a gantry 200, an exposure light-source unit250, a moving stage unit MSU, a guide frame unit 600, a distance sensorunit 700, a balance mass unit 800, and a controller 900.

The base frame 100 may support various components included in thesubstrate processing apparatus 10. For example, the various componentsmay include the gantry 200, the exposure light-source unit 250, themoving stage unit MSU, the distance sensor unit 700, and the balancemass unit 800. The base frame 100 may include a lower base 110 and firstand second upper bases 120 and 130 on the lower base 110. The first andsecond upper bases 120 and 130 may be elongated in a y-axis direction Yand be spaced apart from each other in an x-axis direction X crossingthe y-axis direction Y.

A plurality of mounts 140 may be disposed below the lower base 110. Themounts 140 may be isolators and levels. However, the inventive conceptis not limited thereto. As isolators, the mounts 140 may be used tocontrol vibration of the substrate processing apparatus 10. As levels,the mounts 140 may be used to level the substrate processing apparatus10.

The gantry 200 may be disposed above the base frame 100. The gantry 200may include a pair of support members 220 that extend from the baseframe 100 in a z-axis direction Z and an interconnect member 210connected to the pair of support members 220. The z-axis direction Zcrosses the x-axis direction X and the y-axis direction Y. The pair ofsupport members 220 may be spaced apart from each other in the x-axisdirection X. The interconnect member 210 may have a bar shape extendingalong the x-axis direction X. The interconnect member 210 may be spacedapart from the base frame 100 in the z-axis direction Z. Thus, a spacemay be provided between the interconnect member 210 and the base frame100.

In an exemplary embodiment of the inventive concept, the z-axisdirection Z may be an up-and-down direction, the y-axis direction Y maybe a front-and-rear direction, and the x-axis direction X may be aleft-and-right direction. However, the inventive concept is not limitedthereto.

The exposure light-source unit 250 may be provided at the gantry 200. Inan exemplary embodiment of the inventive concept, a plurality ofexposure light-source units 250 may be provided in the interconnectmember 210. The plurality of exposure light-source units 250 may bespaced apart from each other along the x-axis direction X. In anexemplary embodiment of the inventive concept, an exposure light-sourceunit 250 may have a cylindrical shape elongated in the z-axis directionZ, but the inventive concept is not limited thereto. The exposurelight-source unit 250 may direct light for transferring a circuitpattern image onto a substrate in a photolithography process. In anexemplary embodiment of the inventive concept, a light-source unit 250emits light.

The moving stage unit MSU may be configured to move between the baseframe 100 and the interconnect member 210 of the gantry 200. The movingstage unit MSU may include a substrate stage 300, a follower stage 400,a first driving unit 450, a second driving unit 500, and a third drivingunit 550.

The substrate stage 300 may support a substrate and/or a wafer placed onthe substrate. The wafer and the substrate may be collectively referredto as a substrate. The second driving unit 500 may drive the substratestage 300 to move the substrate stage 300 in the y-axis direction Y andthe third driving unit 550 may drive the substrate stage 300 to move thesubstrate stage 300 in the x-axis direction X. The substrate stage 300will be further discussed in detail below.

The first driving unit 450 may drive the follower stage 400 to move thefollower stage 400 in the y-axis direction Y. The follower stage 400 maybe disposed on the same plane as the substrate stage 300. In anexemplary embodiment of the inventive concept, the same plane on whichthe substrate stage 300 and the follower stage 400 are disposed may bean XY plane. The follower stage 400 may not be in contact with thesubstrate stage 300. The follower stage 400 may include a first encoderhead 470. Alternatively, in an exemplary embodiment of the inventiveconcept, the first encoder head 470 may be provided on the first drivingunit 450. The follower stage 400 will be further discussed in detailbelow.

The first driving unit 450 may drive the follower stage 400 to move thefollower stage 400 in the y-axis direction Y, the second driving unit500 may drive the substrate stage 300 to move the substrate stage 300 inthe y-axis direction Y, and the third driving unit 550 may drive thesubstrate stage 300 to move the substrate stage 300 in the x-axisdirection X.

The guide frame unit 600 may support the follower stage 400. Inaddition, the guide frame unit 600 may guide the movement of thefollower stage 400. The guide frame unit 600 may include a first guideframe 601 and a second guide frame 602. The first and second guideframes 601 and 602 may be spaced apart from each other in the x-axisdirection X. The first guide frame 601 may support a side of thefollower stage 400, and the second guide frame 602 may support anopposite side of the follower stage 400. The guide frame unit 600 willbe further discussed in detail below with reference to FIGS. 9 and 10.

The distance sensor unit 700 may include a first distance sensor 710 anda second distance sensor 720. In an exemplary embodiment of theinventive concept, the first and second distance sensors 710 and 720 maybe, but are not limited to, laser sensors.

The first distance sensor 710 may measure a distance between the movingstage unit MSU and the first distance sensor 710 in the y-axis directionY. The second distance sensor 720 may measure a distance between themoving stage unit MSU and the second distance sensor 720 in the x-axisdirection X. The controller 900 may receive information about thedistances measured by the first and second distance sensors 710 and 720.This will be further discussed in detail below with reference to FIG.13.

Since the center of gravity of the substrate processing apparatus 10 canbe changed due to the moving of the moving stage unit MSU, the balancemass unit 800 can be used to provide the substrate processing apparatus10 with a stable center of gravity. Accordingly, the balance mass unit800 may be used to adjust the center of gravity of the substrateprocessing apparatus 10 due to the movement of the moving stage unitMSU. The balance mass unit 800 may include a first balance mass 801 anda second balance mass 802.

The first and second balance masses 801 and 802 may have a shapeextending in the y-axis direction Y. The first and second balance masses801 and 802 may be spaced apart from each other in the x-axis directionX. The first balance mass 801 may move in the y-axis direction Y alongthe first guide frame 601. The second balance mass 802 may move in they-axis direction Y along the second guide frame 602. The first andsecond balance masses 801 and 802 will be further discussed in detailbelow with reference to FIGS. 11 and 12.

The controller 900 may be configured to control the balance mass unit800 and the first, second, and third driving units 450, 500, and 550.The controller 800 may also be configured to control exposure time oflight emitted from the exposure light-source unit 250. The controller900 will be further discussed in detail below.

FIG. 5 is a perspective view illustrating a moving stage unit of FIG. 1according to an exemplary embodiment of the inventive concept. FIG. 6 isa side view illustrating a substrate stage of FIG. 1 according to anexemplary embodiment of the inventive concept. FIG. 7A is across-sectional view taken along line I-I′ of FIG. 5 according to anexemplary embodiment of the inventive concept. FIG. 7B is an enlargedview of section A of FIG. 7A according to an exemplary embodiment of theinventive concept. FIGS. 8A and 8B are perspective views illustrating afollower stage and a portion of a first driving unit of FIG. 5 accordingto an exemplary embodiment of the inventive concept.

Referring to FIGS. 5 to 8B, the substrate stage 300 may include a stagebody 310, a first reflective segment 350, a second reflective segment355, and a first air hearing 330.

In an exemplary embodiment of the inventive concept, the stage body 310may form an external appearance of the substrate stage 300. The stagebody 310 may have a roughly rectangular parallelepiped shape. Asubstrate may be placed on a top surface of the stage body 310. The topsurface of the stage body 310 may be a flat surface, but the inventiveconcept is not limited thereto. The stage body 310 may include a throughopening 315 penetrating the stage body 310 in the x-axis direction X.The through opening 315 may have a roughly rectangular section taken ona YZ plane, but the inventive concept is not limited thereto. In anexemplary embodiment of the inventive concept, the through opening 315may be provided on a central portion of the stage body 310.

The first and second reflective segments 350 and 355 may be provided onthe stage body 310. The first reflective segment 350 may reflect a laserbeam emitted from the first distance sensor (see 710 of FIG. 4). In anexemplary embodiment of the inventive concept, the first reflectivesegment 350 may have a reflective surface from which the laser beam isreflected. The reflective surface of the first reflective segment 350may face the first distance sensor 710.

The second reflective segment 355 may reflect a laser beam emitted fromthe second distance sensor (see 720 of FIG. 4). In an exemplaryembodiment of the inventive concept, the second reflective segment 355may have a reflective surface from which the laser beam is reflected.The reflective surface of the second reflective segment 355 may face thesecond distance sensor 720.

The first air bearing 330 may be provided below the stage body 310. Thefirst air bearing 330 may levitate the substrate stage 300 from the baseframe 100. For example, the first air bearing may thrust, eject or movegas particles to support the weight of the stage body 310. The substratestage 300 may then be spaced apart from, and disposed above the firstand second upper bases 120 and 130. When the substrate stage 300 movesin the x-axis direction X or in the y-axis direction Y, the base frame100 may not receive a reaction in the x-axis direction X or in they-axis direction Y from the substrate stage 300 but only receive forcein the z-axis direction Z. The follower stage 400 may be disposed on thesame plane as the substrate stage 300. In this configuration, when thesubstrate stage 300 moves in the x-axis direction X and/or in the y-axisdirection Y, the follower stage 400 may receive a reaction in the x-axisdirection and/or in the y-axis direction Y.

As shown in FIGS. 8A and 8B, the follower stage 400 may include athrough member 410 passing through the through opening 315. The followerstage 400 may include first and second interconnect members 420 and 425connected to opposite distal ends of the through member 410 and aprotruding member 430 provided below the through member 410. In anexemplary embodiment of the inventive concept, the follower stage 400may have roughly an I-letter shape, but the inventive concept is notlimited thereto.

The through member 410 may be provided in a bar shape extending in thex-axis direction X. The through member 410 may include a first surface411 and a second surface 412 facing each other in the y-axis directionY. The first and second surfaces 411 and 412 may be flat surfaces. Oneor more components of the second driving unit 500 may be engaged witheach of the first and second surfaces 411 and 412.

The through member 410 may include an intermediate opening 413 providedbetween the first and second surfaces 411 and 412 The intermediateopening 413 may be provided along the x-axis direction X. Theintermediate opening 413 may be shaped like a groove or hole. Theintermediate opening 413 may include one or more components of the thirddriving unit 550.

The first and second interconnect members 420 and 425 may have a barshape extending in the y-axis direction Y. One or more components of thefirst driving unit 450 may be engaged with the first and secondinterconnect members 420 and 425. At least one of the first and secondinterconnect members 420 and 425 may be detachably engaged with thethrough member 410. The protruding member 430 may be disposed adjacentto one of the first and second interconnect members 420 and 425.

The follower stage 400 may include second air bearings 440 (441 and442). In an exemplary embodiment of the inventive concept, the secondair bearings 441 may be provided on lower portions of the first andsecond interconnect members 420 and 425, and the second air bearing 442may be provided on a side surface of the protruding member 430. Thesecond air hearings 441 may levitate the follower stage 400 from theguide frame unit 600. When the follower stage 400 moves in the y-axisdirection Y the base frame 100 may not receive a force in the x-axisdirection, the y-axis direction Y, or the z-axis direction Z.

The first driving unit 450 may include a first motor coil member 452engaged with each of the first and second interconnect members 420 and425, and a first motor magnet member (see 451 of FIG. 9) engaged witheach of the first and second guide frames (see 601 and 602 of FIG. 1).When the first motor coil member 451 is applied with current, the firstmotor coil member 451 may experience thrust in the y-axis direction Y.The follower stage 400 may therefore move in the y-axis direction Y. Thethrust may have magnitude in proportion to a value obtained bymultiplying a magnitude of the current applied to the first motor coilmember 452 and the magnetic flux of the first motor magnet member 451.In an exemplary embodiment of the inventive concept, the first drivingunit 450 may be, but is not limited to, a linear motor.

The second driving unit 500 may include a voice magnet member 510provided on the substrate stage 300 and a voice coil member 520 providedon the follower stage 400. In an exemplary embodiment of the inventiveconcept, the second driving unit 500 may be, but is not limited to, avoice coil motor.

The voice magnet member 510 may be disposed in the through opening 315of the stage body 310. For example, the voice magnet member 510 may befixedly engaged with an inner wall of the through opening 315. The voicemagnet member 510 may include a permanent magnet extending in the x-axisdirection X. However, it is understood that the voice magnet member 510may also include an electromagnet. The voice magnet member 510 mayinclude insert openings 511 a and 512 a into which the voice coil member520 is respectively inserted. In an exemplary embodiment of theinventive concept, the insert openings 511 a and 512 a may be shapedlike a groove, or alternatively, like a hole. In an exemplary embodimentof the inventive concept, as shown in FIG. 7A, a depth of the opening511 a in the y-axis direction Y is smaller than a length of the firstvoice magnet 511 in the x-axis direction. The voice magnet member 510may include first and second voice magnets 511 and 512 spaced apart fromeach other in the y-axis direction Y. In an exemplary embodiment of theinventive concept, the first voice magnet 511 may include the insertopening 511 a, and the second voice magnet 512 may include the insertopening 512 a. The first and second voice magnets 511 and 512 may beprovided to have a bracket (or an open square) sectional shape taken onthe ZY plane.

The voice coil member 520 may be provided on the through member 410 ofthe follower stage 400. The voice coil member 520 may include a firstcoil plate 521 that is inserted into the first insert opening 511 a ofthe first voice magnet 511 and a second coil plate 522 that is insertedinto the second insert opening 512 a of the second voice magnet 512. Thefirst and second coil plates 521 may include an electromagnetic coil.The voice coil member 520 may be positioned in a magnetic fieldgenerated by the voice magnet member 510 such that the voice magnetmember 510 may experience a Lorentz force in the y-axis direction Y. Inthis configuration, when the voice coil member 520 is applied withcurrent, the substrate stage 300 may move in the y-axis direction Y.

The first coil plate 521 may be provided on the first surface 411 of thethrough member 410. The second coil plate 522 may be provided on thesecond surface 412 of the through member 410. In an exemplary embodimentof the inventive concept, each of the first and second coil plates 521and 522 may include two sub plates spaced apart from each other in thex-axis direction X.

As shown in FIG. 7B, the voice coil member 520 may be spaced apart fromthe voice magnet member 510. In an exemplary embodiment of the inventiveconcept, the first voice magnet 511 may be spaced apart from the firstcoil plate 521, inserted into the first insert opening 511 a of thefirst voice magnet 511. The second voice magnet 512 may be spaced apartfrom the second coil plate 522 inserted into the second insert opening512 a of the second voice magnet 512. For example, a gap G1 of about 2mm to about 6 mm may be formed between a top surface of the first coilplate 521 and an inner surface of the first voice magnet 511 that facesthe top surface of the first coil plate 521. A gap G2 of about 2 mm toabout 6 mm may be formed between a bottom surface of the first coilplate 521 and an inner surface of the first voice magnet 511 that facesthe bottom surface of the first coil plate 521. However, the inventiveconcept is not limited thereto.

The third driving unit 550 may drive the substrate stage 300 to move thesubstrate stage 300 in the x-axis direction X. In an exemplaryembodiment of the inventive concept, the third driving unit 550 may be,but is not limited to, a linear motor. The third driving unit 550 mayinclude a second motor magnet member 551 provided on the substrate stage300 and a second motor coil member 552 provided on the follower stage400. Alternatively, in an exemplary embodiment of the inventive concept,the second motor magnet member 551 may be provided on the follower stage400, and the second motor coil member 552 may be provided on thesubstrate stage 300.

The second motor magnet member 551 may be provided in the throughopening 315. The second motor magnet member 551 may be spaced apart fromthe voice magnet member 510 of the second driving unit 500. In anexemplary embodiment of the inventive concept, the second motor magnetmember 551 may be provided between the first and second voice magnets511 and 512. In addition, a portion of the second motor magnet member551 may be disposed in the intermediate opening 413 of the throughmember 410.

The second coil member 552 may be provided on the through member 410 ofthe follower stage 400. In an exemplary embodiment of the inventiveconcept, the second motor magnet member 552 may be disposed in theintermediate opening 413 of the through member 410. The second motorcoil member 552 may be disposed between the first and second coil plates521 and 522. The second motor coil member 552 may have a plate shapeextending in the x-axis direction X. The second motor coil member 552may be inserted into a groove 551 a formed on the second motor magnetmember 551. When the second motor coil member 552 is applied withcurrent, the second motor magnet member 551 may experience thrust in thex-axis direction X. The substrate stage 300 may therefore move thex-axis direction X.

FIG. 9 is a perspective vim illustrating a guide frame unit, a portionof a first driving unit, and a portion of a balance mass unit of FIG. 1,according to an exemplary embodiment of the inventive concept. FIG. 10is a front view illustrating a guide frame unit, a portion of a firstdriving unit, and a portion of a balance mass unit of FIG. 1, accordingto an exemplary embodiment of the inventive concept.

Referring to FIGS. 9 and 10, the guide frame unit 600 may include thefirst and second guide frames 601 and 602 spaced apart from each otherin the x-axis direction X. The first and second guide frames 601 and 602may respectively include guide portions 6011 and 6021, first supportportions 6012 and 6022 that support first sides of the guide portions6011 and 6021, and second support portions 6013 and 6023 that supportsecond sides of the guide portions 6011 and 6021. The first and secondguide frames 601 and 602 may further include corresponding extensionportions 6014 and 602.4 that extend toward the substrate stage (see 300of FIG. 3) from the guide portions 6011 and 6021, and motor magnetaccommodating portions 6015 and 6025 that are provided on respective topsurfaces of the guide portions 6011 and 6021. The motor magnetaccommodating portions 6015 and 6025 may extend in the y-axis directionY on the guide portions 6011 and 6021. The motor magnet accommodatingportions 6015 and 6025 may include accommodating grooves 451 a extendingin the y-axis direction Y.

In an exemplary embodiment of the inventive concept, the first supportportions 6012 and 6022 may be connected to corresponding distal ends ofthe guide portions 6011 and 6021, and the second support portions 6013and 602.3 may be connected to corresponding opposite distal ends of theguide portions 6011 and 6021. Each of the first and second supportportions 6012, 6013, 6022, and 6023 may be parallel to the z-axisdirection Z, and the guide portions 6011 and 6021 and the extensionportions 6014 and 6024 may be parallel to the y-axis direction Y.

Each of the first and second support portions 6012, 6013, 6022, and 6023may be connected to the ground. The guide frame unit 600 may absorb areaction produced when the follower stage (see 400 of FIG. 3) is moving,and the reaction may be transferred to the ground. For example, theguide frame unit 600 may force the ground to take the reaction in they-axis direction Y caused by the movement of the follower stage 400 andthe reaction in the z-axis direction Z caused by the movement of thefollower stage 400. In other words, the guide frame unit 600 may absorbthe reaction generated when the follower stage 400 is moving. Thereaction may also be absorbed or reduced through the control of thebalance mass unit 800, engaged with the guide frame unit 600.

The first driving unit 450 may be partly accommodated in the motormagnet accommodating portions 6015 and 6025 of the guide frame unit 600.In an exemplary embodiment of the inventive concept, the first motormagnet member 451 may be inserted into the accommodating grooves 451 aof each of the motor magnet accommodating portions 6015 and 6025.Therefore, the first motor magnet member 451 may be fixedly engaged withthe guide frame unit 600.

In an exemplary embodiment of the inventive concept, the first motormagnet member 451 may include a groove 451 a into which the first motorcoil member 451 is inserted. The first motor coil member 451 may then bepositioned in a magnetic field produced by the first motor magnet member451. The first motor magnet member 451 may have a roughly bracket (e.g.,an open square) sectional shape, but the inventive concept is notlimited thereto.

A first linear scale may be provided on a top surface of each of theguide portions 6011 and 6021. The first linear scale may be providedalong the y-axis direction Y. The first linear scale may includeinformation about a y-axis position along the y-axis direction Y. As thefirst encoder head (see 470 of FIG. 4) moves in the y-axis direction Ytogether with the follower stage 400, the information about the y-axisposition of the first encoder head (see 470 of FIG. 4) and/or thefollower stage 400 may be obtained from the first linear scale.Accordingly, the location of the follower stage 400 may be determinedalong the y-axis direction Y.

One or more components of the balance mass unit 800 may be engaged withthe extension portions 6014 and 6024, as described below with referenceto FIGS. 11 and 12.

FIG. 11 is a perspective view illustrating a balance mass unit of FIG. 1according to an exemplary embodiment of the inventive concept. FIG. 12is a front view illustrating a balance mass unit of FIG. 1 according toan exemplary embodiment of the inventive concept. As discussed above,the balance mass unit 800 may include the first balance mass 801 and thesecond balance mass 802. Since the first and second balance masses 801and 802 may have the same configuration, only the first balance mass 801will be described in detail below for brevity.

Referring to FIGS. 8A to 12, the first balance mass 801 may include abalance body 810, a third motor magnet member 820, and a third motorcoil member 830 (See FIG. 10). The first balance mass 801 may furtherinclude a second linear scale 840, a second encoder head (see 850 ofFIG. 4), and a third air bearing 860.

The balance body 810 may be provided in a bar shape extending in they-axis direction Y. The balance body 810 may include a first balancegroove 815 into which the third motor magnet member 820 or the thirdmotor coil member 830 is inserted. The first balance groove 815 mayextend along the y-axis direction Y. In an exemplary embodiment of theinventive concept, the balance body 810 may be provided to have aroughly bracket (or an open square) or U-letter sectional shape taken onthe ZX plane, but the inventive concept is not limited thereto. Thebalance body 810 may have a mass used in balancing the center of gravityof the structure including at least the guide frame unit 600 and themoving stage unit MSU. The center of gravity of the structure includingat least the guide frame unit 600 and the moving stage unit MSU may needto be balanced due to the movement of the moving stage unit MSU.

The third motor magnet member 820 may be inserted into the first balancegroove 815. In an exemplary embodiment of the inventive concept, thethird motor magnet member 820 may be fixed in the first balance groove815. The third motor magnet member 820 may be provided in a bar shapeextending in the y-axis direction Y. The third motor magnet member 820may include a second balance groove 825 provided along the y-axisdirection Y. In an exemplary embodiment of the inventive concept, thethird motor magnet member 820 may be provided to have a roughly bracket(or an open square) sectional shape taken on the ZX plane.Alternatively, in an exemplary embodiment of the inventive concept, thethird motor magnet member 820 may be provided as a pair of permanentmagnets or electromagnets shaped like plates and spaced apart from eachother in the x-axis direction X and elongated in the y-axis direction Y.

As shown in FIGS. 9 and 10, the third motor coil member 830 may beprovided on the guide frame unit 600. In an exemplary embodiment of theinventive concept, the third motor coil member 830 of the first balancemass 801 may be fixed on the extension portion 6014 of the first guideframe 601. The third motor coil member 830 may be positioned below theextension portion 6014.

The third motor magnet member 830 may be inserted into the secondbalance groove 825. The third motor coil member 830 may then bepositioned in magnetic field produced by the third motor magnet member820. When the third motor coil member 830 is applied with current, thethird motor coil member 820 may experience thrust in the y-axisdirection Y. Hence, the balance body 810 may move in the y-axisdirection Y together with the third motor magnet member 820.

The second linear scale 840 may be provided on a top surface 811 of thebalance body 810. For example, the second linear scale 840 may beprovided along the y-axis direction Y on the top surface 811 of thebalance body 810. The second linear scale 840 may be used to determine aposition of the balance body 810 along the y-axis direction Y.

The second encoder head 850 may be provided on the guide frame unit 600.In an exemplary embodiment of the inventive concept, the second encoderhead 850 may be fixed on the extension portion 6014. The second encoderhead 850 may obtain the information about the position of the balancebody 810, on the second linear scale 840, along the y-axis direction Yusing the second linear scale 840. The obtained information may bedelivered to the controller (see 900 of FIG. 4) from the second encoderhead 850. The controller 900 may control a position of the balance body810 in the y-axis direction Y by using the information indicating theposition of the balance body 810. For example, the controller 900 mayadjust current applied to the third motor coil member 830 to control theposition of the balance body 810 in the y-axis direction Y.

The third air bearings 860 (861 and 862) may be provided on the balancebody 810. In an exemplary embodiment of the inventive concept, thebalance body 810 may have a side surface 813 which faces a side surfaceof the first upper frame (see 120 of FIG. 3), and on which the third airbearing 861 is provided. The third air bearing 861 may create a preload.The balance body 810 may also have a bottom surface 812 which faces atop surface of the lower base (see 110 of FIG. 3), and on which thethird air bearing 862 is provided. The third air bearing 862 maylevitate the balance body 810 from a top surface of the base frame (see100 of FIG. 3). Therefore, the balance body 810 may move in the y-axisdirection Y while reducing or minimizing a horizontal error caused byvariation in center of gravity of the balance frame 100.

FIG. 13 is a diagram illustrating movement of a moving stage unit ofFIG. 1 according to an exemplary embodiment of the inventive concept.

Referring to FIGS. 4 and 13, the first distance sensor 710 may be spacedapart from the moving stage unit MSU in the y-axis direction Y. Thefirst distance sensor 710 may measure a position of the substrate stage300 in the y-axis direction Y.

For example, the first distance sensor 710 may direct a laser beamtoward the substrate stage 300. The laser beam may be reflected from thefirst reflective segment 350 of the substrate stage 300. The firstdistance sensor 710 may receive the reflected laser beam to measure afirst distance L1 in the y-axis direction Y between the first distancesensor 710 and the substrate stage 300. The first distance sensor 710may also measure a second distance L2 in the y-axis direction Y betweenthe first distance sensor 710 and the follower stage 400. The seconddistance sensor 720 may be spaced apart from the moving stage unit MSUin the x-axis direction X. The second distance sensor 720 may measure athird distance L3 in the x-axis direction X between the second distancesensor 720 and the substrate stage 300. The controller 900 may receiveinformation about the first, second, and third distances L1, L2, and L3measured by the first and second distance sensors 710 and 720. Thecontroller 900 may use the received information about the first to thirddistances L1 to L3 to calculate at least one of the x- and y-axispositions of the substrate stage 300 and the y-axis position of thefollower stage 400. Alternatively, in an exemplary embodiment of theinventive concept, the first encoder head 470 may move in the y-axisdirection Y together with the follower stage 400, on which the firstencoder head 470 is provided. The first encoder head 470 moving in they-axis direction Y may acquire information about the y-axis position ofthe follower stage 400 from the first linear scale, which may beprovided on the guide frame unit 600. The controller 900 may receivefrom the first encoder head 470 the acquired information about they-axis position of the follower stage 400.

FIG. 14 is a flow chart illustrating a driving operation of a movingstage unit of FIG. 1, according to an exemplary embodiment of theinventive concept.

Referring to FIGS. 4, 13 and 14, the controller 900 may receiveinformation about an intended y-axis position of the substrate stage 300(S11) through an external input section. The controller 900 may controlthe second driving unit 500 based on the received information about theintended y-axis position of the substrate stage 300. The second drivingunit 500 may drive the substrate stage 300 in the y-axis direction Y toplace the substrate stage 300 in the intended y-axis position (S12).

The first distance sensor 710 may measure a first distance L1 betweenthe first distance sensor 710 and the substrate stage 300 that hasmoved, and the measured first distance L1 may be transferred from thefirst distance sensor 710 to the controller 900. The controller 900 mayuse the first distance L1 to measure the y-axis position of thesubstrate stage 300 that has moved (S13).

The controller 900 may decide whether or not the measured y-axisposition of the moved substrate stage 300 corresponds to the intendedy-axis position of the substrate stage 300 (S14). When the measuredy-axis position of the moved substrate stage 300 does not correspond tothe intended y-axis position of the substrate stage 300, the controller900 may control the second driving unit 500 such that the substratestage 300 may be moved again in the y-axis direction Y. When themeasured y-axis position of the moved substrate stage 300 corresponds tothe intended y-axis position of the substrate stage 300, the controller900 may control the first driving unit 450 based on the calculated (orthe intended) y-axis position of the substrate stage 300. The firstdriving unit 450 may then drive the follower stage 400 to place thefollower stage 400 in the position corresponding to the calculatedy-axis position of the substrate stage 300 (S15). For example, in anexemplary embodiment of the inventive concept, when the substrate stage300 moves to a first location in the y-axis direction Y, the firstdriving unit 450 moves the follower stage 400 in the y-axis direction Yis placed in location corresponding to the first location.

In an exemplary embodiment of the inventive concept, the first distancesensor 710 may measure a second distance L2 between the first distancesensor 710 and the follower stage 400 that has moved, and the measuredsecond distance L2 may be transferred to the controller 900 from thefirst distance sensor 710. The controller 900 may use the seconddistance L2 to measure the y-axis position of the follower stage 400that has moved (S16).

The controller 900 may decide whether or not the measured y-axisposition of the moved substrate stage 300 corresponds to the calculatedy-axis position of the substrate stage 300 (S17). When the measuredy-axis position of the follower stage 400 does not correspond to thecalculated y-axis position of the substrate stage 300, the controller900 may control the first driving unit 450 such that the follower stage400 may be moved again in the y-axis direction Y. The follower stage 400may follow the substrate stage 300.

FIG. 15 is a flow chart illustrating a driving operation of a movingstage unit of FIG. 1, according to an exemplary embodiment of theinventive concept.

Referring to FIGS. 4, 13 and 15, the controller 900 may simultaneouslyreceive information about intended y-axis positions of the substratestage 300 and the follower stage 400 through an external input (S21).The controller 900 may control the second driving unit 500 based on thereceived information about the intended y-axis position of the substratestage 300. The second driving unit 500 may drive the substrate stage 300in the y-axis direction Y to place the substrate stage 300 in theposition corresponding to the intended y-axis position (S22).

The first distance sensor 710 may measure a first distance L1 betweenthe first distance sensor 710 and the substrate stage 300 that hasmoved, and the measured first distance L1 may be transferred to thecontroller 900 from the first distance sensor 710. The controller 900may use the first distance L1 to measure a y-axis position of thesubstrate stage 300 that has moved (S23).

The controller 900 may decide whether or not the measured y-axisposition of the moved substrate stage 300 corresponds to the intendedy-axis position of the substrate stage 300 (S24). When the measuredy-axis position of the moved substrate stage 300 does not correspond tothe intended y-axis position of the substrate stage 300, the controller900 may control the second driving unit 500 such that the substratestage 300 may be moved again in the y-axis direction Y.

The controller 900 may control the first driving unit 450 based on thereceived information about the intended y-axis position of the followerstage 400. The first driving unit 450 may drive the follower stage 400in the y-axis direction Y to place the follower stage 400 in theintended y-axis position (S25).

The first distance sensor 710 may measure a second distance L2 betweenthe first distance sensor 710 and the follower stage 400 that has moved,and the measured second distance L2 may be delivered to the controller900 from the first distance sensor 710. The controller 900 may use thesecond distance L2 to measure a y-axis position of the follower stage400 that has moved (S26).

The controller 900 may decide whether or not the measured y-axisposition of the moved follower stage 400 corresponds to the intendedy-axis position of the follower stage 400 (S27). When the measuredy-axis position of the moved follower stage 400 does not correspond tothe intended y-axis position of the follower stage 400, the controller900 may control the first driving unit 450 to move the follower stage400 in the y-axis direction Y to the intended y-axis position.

FIG. 16 is a perspective view illustrating a movement relationshipbetween a moving stage unit and a balance mass unit of FIG. 1 accordingto an exemplary embodiment of the inventive concept.

Referring to FIG. 16, the moving stage unit MSU may move along they-axis direction Y, and at the same time, the first and second balancemasses 801 and 802 may move in an opposite direction to that of themoving stage unit MSU. For example, the first and second balance masses801 and 802 may move in an opposite direction to that of the followerstage 400 and/or the substrate stage 300. Accordingly, the substrateprocessing apparatus 10 may be prevented from changing its center ofgravity due to the movement of the moving stage unit MSU. The movementof the balance mass unit 800 may counterbalance a reaction transferredto the guide frame unit 600 when the follower stage 400 is moving.

According to the inventive concept, as the substrate stage 300 moveswithout being in contact with the follower stage 400, externaldisturbance acting on the substrate stage 300 from the follower stage400 may be blocked. A reaction caused by the movement of the followerstage 400 may be compensated by the balance mass unit 800 or may bedelivered to the ground through the guide frame unit 600. Therefore, thereaction caused by the movement of the follower stage 400 may not bedelivered to the substrate stage 300.

While the inventive concept has been particularly shown and describedwith reference to exemplary embodiments thereof, it will be apparent tothose of ordinary skill in the art that various changes in form anddetail may be made therein without departing from the spirit and scopeof the inventive concept as defined by the following claims.

What is claimed is
 1. A substrate processing apparatus, comprising: abase frame; a gantry disposed above the base frame; and a moving stageunit that moves between the base frame and the gantry, wherein themoving stage unit comprises: a substrate stage that supports asubstrate; a follower stage disposed on the substrate stage; a firstdriving unit that moves the follower stage in parallel with a firstdirection; and a second driving unit that moves the substrate stage inparallel with the first direction, wherein the second driving unitcomprises: a magnet member disposed on the substrate stage; and a coilmember disposed on the follower stage and spaced apart from the magnetmember, wherein the substrate stage comprises a through openingpenetrating the substrate stage in a second direction crossing the firstdirection, wherein the follower stage comprises a through member thatpasses through the through opening, wherein the coil member is disposedon the through member, wherein the magnet member is disposed in thethrough opening, wherein the coil member comprises: a first coil platedisposed on a first surface of the through member; and a second coilplate disposed on a second surface of the through member, the secondsurface being spaced apart from the first surface in the firstdirection, and wherein the magnet member comprises: a first magnetincluding a first opening into which the first coil plate is inserted;and a second magnet including a second opening into which the secondcoil plate is inserted, the second magnet being spaced apart from thefirst magnet in the first direction.
 2. The substrate processingapparatus of claim 1, further comprising a third driving unit that movesthe substrate stage in parallel with the second direction, wherein thethird driving unit comprises: a motor coil member disposed on thethrough member; and a motor magnet member disposed in the throughopening.
 3. The substrate processing apparatus of claim 2, wherein thethrough member comprises an intermediate opening between the firstsurface and the second surface of the through member, and wherein themotor coil member is disposed in the intermediate opening.
 4. Thesubstrate processing apparatus of claim 1, wherein, when the substratestage moves in parallel with the first direction and is placed in afirst location, the first driving unit moves the follower stage inparallel with the first direction such that the follower stage is placedin a location corresponding to the first location.
 5. The substrateprocessing apparatus of claim 1, further comprising: a first guide framethat supports a side of the follower stage; and a second guide framethat supports an opposite side of the follower stage, wherein the secondguide frame is spaced apart from the first guide frame in the seconddirection.
 6. The substrate processing apparatus of claim 5, whereineach of the first and second guide frames comprises: a guide portionthat is elongated in the first direction and guides a movement of thefollower stage; a first support portion that supports a side of theguide portion; and a second support portion that supports an oppositeside of the guide portion, wherein the second support portion is spacedapart from the first support portion in the first direction.
 7. Thesubstrate processing apparatus of claim 6, further comprising: a firstbalance mass that moves in parallel with the first direction along theguide portion of the first guide frame; and a second balance mass thatmoves in parallel with the first direction along the guide portion ofthe second guide frame.
 8. The substrate processing apparatus of claim7, wherein each of the first and second balance masses comprises: abalance body that includes a first groove extending in the firstdirection; a motor magnet member that includes a second groove extendingin the first direction, wherein the second groove is inserted into thefirst groove; and a motor coil member that is disposed on each of thefirst and second guide frames, wherein the motor coil member is insertedinto the second groove.
 9. The substrate processing apparatus of claim7, wherein the first and second balance masses move in an oppositedirection to that of the follower stage.
 10. The substrate processingapparatus of claim 1, wherein the follower stage is not in contact withthe substrate stage.
 11. The substrate processing apparatus of claim 1,wherein the first magnet is spaced apart from the first coil plate. 12.The substrate processing apparatus of claim 11, wherein a gap betweenthe first magnet and the first coil plate is about 2 mm to about 6 mm.13. A substrate processing apparatus, comprising: a substrate stage thatsupports a substrate; a follower stage disposed on the substrate stage;a first driving unit that moves the follower stage in parallel with afirst direction; and a second driving unit that moves the substratestage in parallel with the first direction, wherein the second drivingunit comprises: a magnet member disposed on the substrate stage; and acoil member disposed on the follower stage and spaced apart from themagnet member, wherein the substrate stage comprises a through openingpenetrating the substrate stage in a second direction crossing the firstdirection, wherein the follower stage comprises a through member thatpasses through the through opening, wherein the coil member is disposedon the through member, wherein the magnet member is disposed in thethrough opening, wherein the coil member comprises: first coil platedisposed on a first surface of the through member; and a second coilplate disposed on a second surface of the through member, the secondsurface being spaced apart from the first surface in the firstdirection, and wherein the magnet member comprises: a first magnetincluding a first opening into which the first coil plate is inserted;and a second magnet including a second opening into which the secondcoil plate is inserted, the second magnet being spaced apart from thefirst magnet in the first direction.
 14. The substrate processingapparatus of claim 13, further comprising: a first guide frame thatsupports a side of the follower stage; and a second guide frame thatsupports an opposite side of the follower stage, wherein the secondguide frame is spaced apart from the first guide frame in the seconddirection.
 15. The substrate processing apparatus of claim 14, whereineach of the first and second guide frames comprises: a guide portionthat is elongated in the first direction and guides a movement of thefollower stage; a first support portion that supports a side of theguide portion; and a second support portion that supports an oppositeside of the guide portion, wherein the second support portion is spacedapart from the first support portion in the first direction.
 16. Thesubstrate processing apparatus of claim 15, further comprising: a firstbalance mass that moves in parallel with the first direction along theguide portion of the first guide frame; and a second balance mass thatmoves in parallel with the first direction along the guide portion ofthe second guide frame.
 17. The substrate processing apparatus of claim16, wherein each of the first and second balance masses comprises: abalance body that includes a first groove extending in the firstdirection; a motor magnet member that includes a second groove extendingin the first direction, wherein the second groove is inserted into thefirst groove; and a motor coil member that is disposed on each of thefirst and second guide frames, wherein the motor coil member is insertedinto the second groove.
 18. The substrate processing apparatus of claim13, wherein the follower stage is not in contact with the substratestage.
 19. The substrate processing apparatus of claim 1.3, wherein thefirst magnet is spaced apart from the first coil plate.
 20. Thesubstrate processing apparatus of claim 19, wherein a gap between thefirst magnet and the first coil plate is about 2 mm to about 6 mm.